NT4001 Lithography and Nanofabrication Syllabus:
NT4001 Lithography and Nanofabrication Syllabus – Anna University PG Syllabus Regulation 2021
OBJECTIVES
To learn lithographic techniques.
To obtain knowledge on nanofabrication of devices using lithography.
UNIT I SEMICONDUCTOR PROCESSING AND MICROFABRICATION
Introduction to semiconductor device processing – Necessity and different types of clean rooms construction and maintenance of a clean room – Microfabrication process flow diagram – Chip cleaning, coating of photoresists, patterning, etching, inspection – Process integration – Etching techniques- Reactive Ion etching- RIE reactive ion etching- Magnetically enhanced RIE- IBE Ion beam etching.
UNIT II PHOTOLITHOGRAPHY AND PATTERNING OF THIN FILMS
Lithography -Optical lithography – different modes – Optical projection lithography – Multistage scanners – resolution and limits of photolithography – Resolution enhancement techniques – Photomask- Binary mask- Phase shift mask – Attenuated phase shift masks – alternating phase shift masks – Off axis illumination- Optical proximity correction – Sub resolution assist feature enhancement-Optical immersion lithography
UNIT III DIRECT WRITING METHODS-MASKLESS OPTICAL LITHOGRAPHY
Maskless optical projection lithography – types, Advantages and Limitations – required components – Zone plate array lithography – Extreme ultraviolet lithography – Light sources – Optics and materials issues
UNIT IV ELECTRON BEAM LITHOGRAPHY (EBL), X-RAY AND ION BEAM LITHOGRAPHY
Scanning electron-beam lithography- Electron sources, and electron optics system mask less EBL- parallel direct-write e-beam systems-electron beam projection lithography – Scattering with angular limitation projection e-beam lithography (SCALPEL) – Projection reduction exposure with variable axis immersion lenses. XRPP – Ion beam lithography- Focusing ion beam lithography – Ion projection lithography.
UNIT V NANOIMPRINT LITHOGRAPHY AND SOFT LITHOGRAPHY
Nanoimprint lithography (NIL)- NIL – hot embossing – UV-NIL- Soft Lithography- Moulding/Replica moulding: PDMS stamps – Printing with soft stamps- Edge lithography – Dip-Pen Lithography-set up and working principle – Self-assembly – LB films – Rapid prototyping.
TOTAL : 45 PERIODS
COURSE OUTCOMES:
CO1: Will realize the importance of miniaturization and nano fabrications
CO2: Will learn about various types of lithographic techniques
CO3: The students will able to understand the merits and de-merits of each lithographic techniques used for nanofabrication
REFERENCES:
1. Chris Mack, Fundamental Principles of Optical Lithography: The Science of Microfabrication, Wiley, 2008.
2. D. S. Dhaliwal et al., PREVAIL –“Electron projection technology approach for next generation lithography”, IBM Journal Res. & Dev. 45, 615 (2001).
3. M. Baker et al., “Lithographic pattern formation via metastable state rare gas atomic beams”, Nanotechnology 15, 1356 (2004).
4. H. Schift et al., “Fabrication of polymer photonic crystals using nanoimprint lithography”, Nanotechnology 16, 261, (2005).
5. R.D. Piner, “Dip-Pen” Nanolithography, Science 283, 661 (1999).